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Graphite Purification
Features:
⏺ High-temperature purification of graphite bulk materials used in the semiconductor industry. Through high temperature and low pressure atmosphere, purity can be increased from 3N to 5~6N.
⏺ Effectively removes impurity elements (such as metals and oxides), significantly reducing material impurity to below 5 ppm, meeting the requirements of extremely high cleanliness processes in semiconductor manufacturing.
⏺ Combining multi-stage precision high-temperature heat treatment with a special atmosphere control mechanism, it not only has higher impurity removal efficiency but also avoids damage to the material structure.
Applications:
(1) Graphite crucible and hot zone for crystal growth furnace
(2) Soft and hard felt natural graphite sheets for crystal growth furnace
(3) Graphite support plate for MOCVD epitaxial equipment
(4) Graphite components for ion implantation machine
Services:
◼️ Provides overall design and contract manufacturing services for graphite bulk and powder purification.
Product:
⏺ Purified graphite blocks
(1) Purity: > 99.9995% (5N5)
(2) Impurity content: < 5 ppm
(3) Surface cleanliness: Meets semiconductor grade specifications
(4) GDMS purity analysis results:
Purity: 99.999929% Impurity: 0.71ppm